Photoresist cover plate
Our Photoresist Cover Plate is designed for spin coating equipment used in semiconductor photolithography processes. It helps control the flow path of photoresist liquids during coating, reducing splashing and overflow while maintaining cleanliness inside the equipment chamber and ensuring a stable processing environment.
The product is manufactured using high-strength aluminum alloys or chemically resistant materials, combined with precision CNC machining and specialized surface treatments. This ensures excellent dimensional stability and durability even under high-speed rotation and chemical exposure, making it suitable for various semiconductor photolithography spin coating equipment.
Product Advantages
- Two-Piece Split Structure: Designed with a symmetrical two-piece structure featuring precision hinges and locking mechanisms, allowing quick installation, removal, and cleaning while reducing equipment maintenance time.
- High-Precision CNC Machining: Precision CNC machining ensures controlled roundness and flatness, allowing the cover plate to fit well with the equipment structure and maintain stable spin coating performance.
- Excellent Chemical Resistance: Surface treatments such as anodizing, hard anodizing, or special coatings provide strong resistance to solvents and chemical exposure, suitable for photoresist processing environments.
- Low Particle Generation: Fine surface finishing reduces liquid adhesion and particle generation, meeting strict cleanroom contamination control requirements.
- Custom Design Capability: The design and manufacturing can be customized according to equipment requirements.
Applications
- Semiconductor Photolithography Process: Used in spin coating equipment for photoresist flow control and splash protection.
- Wafer Edge Protection: Helps reduce chemical contamination around wafer edges and backside during processing.
- Equipment Component Replacement: Suitable as replacement parts for various mainstream semiconductor photolithography equipment.
Photoresist Cover Plate designed for semiconductor photolithography processes, used in spin coating equipment (Spin Coater). | PEEK & PI Plastic CNC Machining Manufacturer | Shen-Yueh (SYT)
Located in Taiwan since 2006, Shen-Yueh Technology co., Ltd. has been a CNC plastic and metal machining manufacturer in Metal Processing Industry. Their main CNC machining supplies include, Photoresist cover plate, CNC plastic machining, air knife productions, PEEK plastic machining and fabrication, CNC metal machining, Polyimide (PI) plastic CNC machining and milling, and bearing, which are delivered with expanded production capacity, short lead time, and better customer service.
SHEN-YUEH is composed of semiconductor equipment and machining design personnel who cooperate with the CNC professional technician team, which has more than 10 years of experience. The production process is carried out in accordance with ISO and a clean factory environment to provide excellent professional consultations and service! We focus on CNC parts processing and equipment transformation experience in the semiconductor and panel industries (since 2006). For more than 10 years, we have solved problems of design, development, and organization optimization and increased the lifecycle of parts, reducing costs for many customers and quickly providing manufacturing samples to reduce customer development time.
Shen-Yueh (SYT) has been offering high-quality equipment part manufacturing for semiconductor manufacturing department, panel and comprehensive industries, both with advanced engineering technology and 13 years of experience, Shen-Yueh (SYT) ensures each customer's demands are met.



